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Effect on Modal-Index due to an Etched Film Thickness in 3-D Ridge Waveguide Structure

S. K. Raghuwanshi*, Ajay Kumar**, Santosh Kumar***

PhD Student, Photonics Lab, Department of Electronics Engineering, Indian School of Mines , Dhanbad, India

Assistant Professor, Photonics Lab, Department of Electronics Engineering, Indian School of Mines , Dhanbad, India

Periodicity:November - January'2013
DOI : https://doi.org/10.26634/jcs.2.1.2074

Abstract

The ridge waveguides is the most commonly used structure in integrated optics, especially in semiconductor diode lasers. Demands for new applications such as high-speed data backplanes in integrated electronics, waveguide filters, optical multiplexers and optical switches are driving technology toward better materials and processing techniques for planar waveguide structures. This paper addresses mainly the application of modal method to analyze the 3-D ridge waveguide structure. We have analyzed the modal index of ridge waveguide using various numerical methods based on Beam propagation method. Scalar, semi-vector, and full-vector propagation analysis are done for different etched film thickness (d) . The results calculated by the proposed scheme for dispersion characteristics of ridge waveguides shows good agreement with previously published data based on other rigorous numerical methods.

Keywords

Ridge waveguide; Modal-index; Beam Propagation Method.

How to Cite this Article?

Kumar, A., Raghuwanshi, S. K., and Kumar, S. (2013). Effect on Modal-Index Due to an Etched Film Thickness In 3-D Ridge Waveguide Structure. i-manager’s Journal on Communication Engineering and Systems, 2(1), 26-31. https://doi.org/10.26634/jcs.2.1.2074

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Effect on Modal-Index due to an Etched Film Thickness in 3-D Ridge Waveguide Structure

Abstract

Keywords

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