Modelling and Simulation for Short-Channel Junction Less Double Gate MOSFETs

S. Darwin*, I. Jenifer **
*-** Department of Electronics & Communication Engineering, Dr. Sivanthi Aditanar College of Engineering, Tiruchendur, Tamil Nadu, India.
Periodicity:March - May'2021
DOI : https://doi.org/10.26634/jele.11.3.18460

Abstract

Semiconductor junctions are present in all existing transistors, and transistors are the fundamental building blocks of modern electronic devices. A strongly doped device with the same type of doping in the channel area as the source and drain regions is known as a junctionless (JL) transistor. Chipmakers utilise junction-less transistors to build smaller devices. This work examines junctionless Double Gate (JL DG) MOSFETs with Threshold Voltage Roll-Off (TVR), DIBL, and Sub-threshold Swing.

Keywords

Metal Oxide Semiconductor Field Effect Transistor (MOSFET), Short Channel Effects (SCE), Double Gate (DG) MOSFET, Junction-Less Double Gate (JL DG) MOSFET, Drain Induced Barrier Lowering (DIBL).

How to Cite this Article?

Darwin, S., and Jenifer, I. (2021). Modelling and Simulation for Short-Channel Junction Less Double Gate MOSFETs. i-manager's Journal on Electronics Engineering, 11(3), 12-17. https://doi.org/10.26634/jele.11.3.18460

References

[3]. Dhiman, G., & Ghosh, P. K. (2017). Threshold voltage modeling for nanometer scale junction less double gate MOSFET. International Journal of Applied Engineering Research, 12(9), 1807-1810.
[11]. Weis, M., Pfitzner, A., Ksprowicz, K., Lin, Y. W., Fischer, T., Emling, R., Marek-Sadowska, M., Schmitt-Landsiedel, D., & Maly, W. (2008). Low power SRAM cell using vertical slit field effect transistor (VeSFET). In 34th European Solid-State Circuits Conference (ESSCIRC FRINGE 2008).
If you have access to this article please login to view the article or kindly login to purchase the article

Purchase Instant Access

Single Article

North Americas,UK,
Middle East,Europe
India Rest of world
USD EUR INR USD-ROW
Pdf 35 35 200 20
Online 35 35 200 15
Pdf & Online 35 35 400 25

Options for accessing this content:
  • If you would like institutional access to this content, please recommend the title to your librarian.
    Library Recommendation Form
  • If you already have i-manager's user account: Login above and proceed to purchase the article.
  • New Users: Please register, then proceed to purchase the article.